METAL SUBSTRATE WITH HIGH REFLECTING LAYER FOR PHOTOELECTRIC DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

The present invention relates to a metal substrate for a photoelectric device coated with a high reflective film and to a manufacturing method thereof. As an embodiment of the present invention, provided is a method for manufacturing a metal substrate for a photoelectric device coated with a high reflective film, comprising the steps of: preparing a metal mother substrate; and forming a metal substrate by coating the metal mother substrate with a high reflective film including aluminum (Al) via a dry coating method. Provided can be a metal substrate for a photoelectric device coated with a high reflective film and a manufacturing method thereof, wherein the performance of a photoelectric device such as the luminance of an OLED can be improved by forming a metallic reflective film having irregularities on the metal mother substrate.