| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask blank production method, and a transfer mask production method capable of suppressing deterioration of flatness.SOLUTION: The mask blank production method comprises the steps for: preparing a glass substrate whose main surface is mirror-polished; heat-treating the prepared glass substrate; and forming a thin film which is formed of a material containing tantalum, and not containing hydrogen substantially, on the main surface of the heat-treated glass substrate.SELECTED DRAWING: Figure 1 |
