| 摘要 |
PURPOSE:To obtain a plotting device for photomask to automatically correct a pattern position of photomask which remarkably deviates to an external size of the photomask. CONSTITUTION:A photomask substrate 1 is returned to a alignment stage 5 and is transported over again if a transported position is out of the standard when detecting an end face of the photomask substrate 1 setted on a photomask holder 8. |
