发明名称 METHOD FOR TREATING A SUBSTRATE WITH PHOTOCATALYTIC PARTICLES SO AS TO MAKE SAID SUBSTRATE SELF-CLEANING
摘要 <p>The invention concerns a method for treating substrates comprising the following steps which consist in: 1) treating the substrates with a dispersion of photocatalytic particles; 2) treating the substrate with at least a siliconized compound selected among the siliconates and the polyorganosiloxanes.</p>
申请公布号 WO2000044687(A1) 申请公布日期 2000.08.03
申请号 FR2000000165 申请日期 2000.01.25
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