发明名称 PHOTOSENSITIVE RESIN COMOPSITION, PHOTOCURABLE PATTERN USING THE SAME AND IMAGE DISPLAY COMPRISING THE SAME
摘要 The present invention relates to a photosensitive resin composition, a photocurable pattern formed thereby, and an image display apparatus including the same. More specifically, the photosensitive resin composition comprises a binder resin, polymerizable monomers, a polymerization initiator, and a solvent. The binder resin includes monomers (a-1) represented by a specific structure, thereby having excellent elastic recovery rate, less deformation against external pressure, equal to or improved pattern forming properties with respect to a substrate under low exposure, and excellent sensitivity.
申请公布号 KR20160087210(A) 申请公布日期 2016.07.21
申请号 KR20150006079 申请日期 2015.01.13
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHO, BAEK HYUN;KIM, KYEONG LOK;CHOI, HWA SUP
分类号 G03F7/033;G03F7/00;G03F7/027 主分类号 G03F7/033
代理机构 代理人
主权项
地址