发明名称 |
PHOTOSENSITIVE RESIN COMOPSITION, PHOTOCURABLE PATTERN USING THE SAME AND IMAGE DISPLAY COMPRISING THE SAME |
摘要 |
The present invention relates to a photosensitive resin composition, a photocurable pattern formed thereby, and an image display apparatus including the same. More specifically, the photosensitive resin composition comprises a binder resin, polymerizable monomers, a polymerization initiator, and a solvent. The binder resin includes monomers (a-1) represented by a specific structure, thereby having excellent elastic recovery rate, less deformation against external pressure, equal to or improved pattern forming properties with respect to a substrate under low exposure, and excellent sensitivity. |
申请公布号 |
KR20160087210(A) |
申请公布日期 |
2016.07.21 |
申请号 |
KR20150006079 |
申请日期 |
2015.01.13 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
CHO, BAEK HYUN;KIM, KYEONG LOK;CHOI, HWA SUP |
分类号 |
G03F7/033;G03F7/00;G03F7/027 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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