| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection method capable of improving the precision of filter processing.SOLUTION: A pattern inspection method includes: a step of acquiring an optical image of a pattern-formed sample to be inspected; a step S114 of performing image development based on design pattern data to be a base of pattern formation of the sample to be inspected for acquiring a designed image; a step S130 of calculating the coefficient of a filter function for filter-processing a designed image, based on area information which defines an area showing a part of the inspection area of the sample to be inspected; a step S214 of using the coefficient and filter-processing the designed image to make a reference image; and a step S230 of comparing the optical image and the reference image for each pixel.SELECTED DRAWING: Figure 4 |
