Self-cleaning chemical vapor deposition apparatus and method

摘要

A self-cleaning chemical vapor deposition (CVD) apparatus and method allow CVD reactors to operate long periods of time without manual removal of extraneous materials such as soot and fuzz. The apparatus is made self-cleaning by superposing a scraping member having a surface, such as a glass rod, over an inner surface of a reactor, and effecting relative movement between the inner surface and scraping member surface. Preferably the reactor is tilted at an angle to horizontal to enhance removal of extraneous material.