| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposing device and an exposing method having high manufacturing efficiency, for performing exposure treatment in a photolithographic process of a large substrate for a flat display panel used for a flat display device. <P>SOLUTION: The large substrate is mounted on a cassette 140 by a carrying-in means in a part 120 prior to an XY stage, the large substrate 150 is placed on the XY stage 110 together with the cassette 140 from the part 120 prior to the XY stage by a carrying part 121, exposure is performed, the large substrate 150 is taken out together with the cassette 140 from the XY stage to a part posterior to the XY stage and the large substrate is carried out from the cassette 140 by a carrying-out means 180 in the part 130 posterior to the XY stage. <P>COPYRIGHT: (C)2007,JPO&INPIT |
