| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus, having an illumination system for imparting an arbitrary polarization distribution to the light for illuminating masks. <P>SOLUTION: The exposure apparatus comprises a fly-eye lens array 104 arranged with fly eyes in a matrix form, in order to equalize the intensity of light being emitted from a light source, and an optical rotation element array 102, consisting of a plurality of optical rotation elements, arranged in correspondence with respective lens element of the fly-eye lens array 104, while having an optical axis parallel with the traveling direction of the light emitted from the light source and making the oscillation plane of passing light rotate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
