发明名称 THE CONVERGENCE PLASMA CLEANING APPRATUS FOR THE VACUUM PUMP , VACUUM LINE AND PFC GASES DECOMPOSITION
摘要 Disclosed is a convergence plasma cleaning apparatus. According to an embodiment of the present invention, the convergent plasma cleaning apparatus comprises: a reactor formed between a semiconductor reactor (chamber) and a vacuum pump to form a transformer coupled plasma (TCP); a ferrite core assembly attached to the outside of the reactor; a power line to apply power to the ferrite core assembly around which the power line is wound, and a power generator; and a ultrahigh frequency apparatus formed outside the reactor and installed not to be overlapped with the position of the ferrite core assembly. The convergent plasma cleaning apparatus discharges an initial plasma inside the reactor by using ultrahigh frequency when a gas is inputted into the semiconductor reactor chamber, and discharges the TCP plasma by applying power to the ferrite core assembly at the same time.
申请公布号 KR20160100022(A) 申请公布日期 2016.08.23
申请号 KR20150022462 申请日期 2015.02.13
申请人 TERATECH CO., LTD. 发明人 HONG, JIN;KWON, GI CHUNG;JANG, DUCK HYUN;SEO, JUNG HYUK;SHIN, JEOM CHEOL;CHOI, JONG YONG;KIM, CHEOL SIK
分类号 H01L21/02;B01D53/32 主分类号 H01L21/02
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