| 摘要 |
PURPOSE:To enlarge the parallel zone of magnetic flux density over the wide target-surface range and to prevent the local erosion of a target, by regulating the distance of the parallel spacing from the respective surfaces of an annular permanent magnet and a central permanent magnet to the surface of a target. CONSTITUTION:A magnetron 18 consisting of an annular permanent magnet 12, a permanent magnet 14 located in the center of the above magnet 12, and a yoke 16 supporting both permanent magnets 12, 14 is disposed in a vacuum tank 10. The parallel spacing H from the respective surfaces of both these permanent magnets 12, 14 to the surface of the target 22 is set up to the range of magnet diameter (D)X0.15-0.05. By this spacing regulation, the parallel components of magnetic flux density in the magnetic field generated from the magnetron 18 are enlarged over the wide range of the target 22 surface. As a result, the target 22 can be eroded over the wide range at the time of sputtering.
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