发明名称 ELECTRON BEAM INSPECTION METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam inspection method and device quick in identification without contamination and static charge, and with high accuracy in identification of a substance with structural defect. SOLUTION: With the use of scattered information of backscattering electrons, an average value S of emission efficiency including a fluctuation▵S is found (a step S304), a plurality of candidate matters causing structural defects of a sample 5 are selected (a step S305) with the use of the average value S and the fluctuation▵S, electron energy of electron beams 2 is made to vary (a step S307), and selection of the candidate matters is repeated to identify the matter causing the structural defect from among the plurality of candidate matter information obtained (a step S308), so that high accuracy is attained in identifying a matter causing structural defect, and further, a low-cost, high-speed, and high-accuracy matter identification is to be realized without the use of an EDS or the like. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007220317(A) 申请公布日期 2007.08.30
申请号 JP20060036093 申请日期 2006.02.14
申请人 JEOL LTD 发明人 NISHIYAMA HIDETOSHI;SUGA MITSUO
分类号 H01J37/256;H01J37/22;H01J37/244 主分类号 H01J37/256
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