发明名称 |
Method and apparatus for simulating standard test wafers |
摘要 |
A method and apparatus are provided for simulating a standard wafer in semiconductor manufacturing equipment. The apparatus includes a support layer suitable for being handled by the semiconductor manufacturing equipment. Applied to the support layer is a mixture including a process agent and a material. During use, the present invention simulates a standard production wafer including material similar to that in the mixture of the present invention.
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申请公布号 |
US2001054600(A1) |
申请公布日期 |
2001.12.27 |
申请号 |
US20010923725 |
申请日期 |
2001.08.06 |
申请人 |
GOLDSPRING GREGORY J.;O'DONNELL ROBERT J. |
发明人 |
GOLDSPRING GREGORY J.;O'DONNELL ROBERT J. |
分类号 |
G03F7/20;H01L23/544;(IPC1-7):G01L21/30 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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