发明名称 |
Electronic die singulation method |
摘要 |
In one embodiment, die are singulated from a wafer having a back layer by placing the wafer onto a carrier substrate with the back layer adjacent the carrier substrate, forming singulation lines through the wafer to expose the back layer within the singulation lines, and applying a pressure substantially uniformly along the second major surface to batch separate the layer of material in the singulation lines. In one embodiment, a fluid filled vessel can be used to apply the pressure. |
申请公布号 |
US9418894(B2) |
申请公布日期 |
2016.08.16 |
申请号 |
US201414222464 |
申请日期 |
2014.03.21 |
申请人 |
SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC |
发明人 |
Grivna Gordon M. |
分类号 |
H01L21/78;H01L21/67;H01L21/683 |
主分类号 |
H01L21/78 |
代理机构 |
|
代理人 |
Jackson Kevin B. |
主权项 |
1. A method of singulating a wafer comprising:
providing a wafer having a plurality of die formed on the wafer and separated from each other by spaces, wherein the wafer has first and second opposing major surfaces, and wherein a layer of material is formed along the second major surface; placing the wafer onto a carrier substrate; singulating the wafer through the spaces to form singulation lines, wherein singulating comprises stopping in proximity to the layer of material; placing the wafer and carrier substrate within a chamber, the chamber at least partially enclosing a pressure transfer vessel, wherein the pressure transfer vessel contains a fluid; and moving a compression structure against the pressure transfer vessel thereby applying a pressure substantially uniformly along the second major surface to separate the layer of material in the singulation lines. |
地址 |
Phoenix AZ US |