发明名称 POSITIONING STAGE SYSTEM AND POSITION MEASURING METHOD
摘要 A positioning stage system includes a first stage movable at least in one of a rotational direction and a tilt direction, a second stage movable at least in X and Y directions, a measurement mirror system fixed to the second stage, a reference mirror system disposed on the first stage, and a measuring system for measuring displacement of the measurement mirror system in the X or Y direction, while using the reference mirror system as a positional reference, wherein the reference mirror system is arranged so that laser light incident on the reference mirror system is reflected in the same direction as the incidence, substantially constantly.
申请公布号 US2002003629(A1) 申请公布日期 2002.01.10
申请号 US19990287262 申请日期 1999.04.07
申请人 MATSUI SHIN 发明人 MATSUI SHIN
分类号 G01B9/02;G01B11/00;G03F7/20;G03F9/00;G03G17/02;G03G17/04;G03G17/06;G03G17/08;G03G17/10;H01L21/027;H01L21/68;(IPC1-7):G03G17/04 主分类号 G01B9/02
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