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发明名称
Lithografische Vorrichtung, Beleuchtungssystem und Debrisauffangsystem
摘要
申请公布号
DE602005004592(D1)
申请公布日期
2008.03.20
申请号
DE200560004592T
申请日期
2005.12.21
申请人
ASML NETHERLANDS B.V.
发明人
BAKKER, LEVINUS PIETER;KLUNDER, DERK JAN WILFRED;VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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