POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type resist composition which gives a photoresist forming a rectangular pattern in the production of a semiconductor device and ensures low edge roughness of a line pattern and a small dimensional shift in the transfer of a pattern to a lower layer in an oxygen plasma etching step. SOLUTION: The positive type photoresist composition contains an acid decomposable polysiloxane having a specified structural unit.