| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive compsn. which has extremely little absorption on a light source of a short wavelength and has excellent solubility, alkaline developability, resolution and dry etching resistance by incorporating a polymer including a structure of a terpenoid skeleton or alicyclic skeleton and a substd. or unsubstd. silyl group in this compsn. SOLUTION: This photosensitive compsn. contains the polymer including the structure of the terpenoid skeleton or alicyclic skeleton and the substd. or unsubstd. silyl group. The terpenoid skeleton is the basic skeleton derived from a terpenoid compd. The terpenoid compd. is a hydrocarbon which adapts itself nearly to an isoprene rule and consists of (C5 H8 )n as a basic compsn., an oxygen contained compd. derived from this hydrocarbon as well as a compd. varying in unsaturation degrees or the precursor and deriv. of the compd. Such terpenoid compd. includes a monoterpene hydrocarbon, monoterpene alcohol, monoterpene aldehyde, etc. |
