| 摘要 |
PROBLEM TO BE SOLVED: To precisely identify a measurement error by contamination.SOLUTION: An error evaluation method includes: a process of performing N scans of each of a plurality of areas set in a sample where a pattern is formed using an electron beam; a process of forming N images based on a secondary electron from the sample for each scan for each area; a process of obtaining the line width of a pattern formed on the area from each of the N images for each area; and a process of obtaining the average value of the line width obtained from the image for each scan onto each area.SELECTED DRAWING: Figure 5 |
