发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
<p>PURPOSE: A semiconductor device and a manufacturing method thereof are provided to prevent the exfoliation between a molding resin and a substrate and improving the quality of the semiconductor device. CONSTITUTION: Peeling between a molding resin and a substrate is to be prevented to improve the quality of a semiconductor device. A film substrate(2) capable of being deformed following shrinkage on curing of a molding resin and having plural partitioned device areas is provided, then a block molding is performed so as to cover the plural device areas in a lump on a chip bearing surface side of the film substrate(2), and thereafter the film substrate(2) is subjected to dicing wherein a cutting blade is advanced toward a block molding portion to divide the film substrate device area by device area in accordance with a down cutting method, whereby peeling of the substrate in the dicing work can be prevented.</p> |
申请公布号 |
KR20020027233(A) |
申请公布日期 |
2002.04.13 |
申请号 |
KR20010061144 |
申请日期 |
2001.10.04 |
申请人 |
HITACHI HOKKAI SEMICONDUCKTOR, LTD.;HITACHI.LTD. |
发明人 |
TOMIHARA SEIICHI |
分类号 |
H01L23/12;H01L21/301;H01L21/56;H01L21/58;H01L23/31;H01L23/498;H05K3/00;H05K3/24;H05K3/28;(IPC1-7):H01L23/31 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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