发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <p>PURPOSE: A semiconductor device and a manufacturing method thereof are provided to prevent the exfoliation between a molding resin and a substrate and improving the quality of the semiconductor device. CONSTITUTION: Peeling between a molding resin and a substrate is to be prevented to improve the quality of a semiconductor device. A film substrate(2) capable of being deformed following shrinkage on curing of a molding resin and having plural partitioned device areas is provided, then a block molding is performed so as to cover the plural device areas in a lump on a chip bearing surface side of the film substrate(2), and thereafter the film substrate(2) is subjected to dicing wherein a cutting blade is advanced toward a block molding portion to divide the film substrate device area by device area in accordance with a down cutting method, whereby peeling of the substrate in the dicing work can be prevented.</p>
申请公布号 KR20020027233(A) 申请公布日期 2002.04.13
申请号 KR20010061144 申请日期 2001.10.04
申请人 HITACHI HOKKAI SEMICONDUCKTOR, LTD.;HITACHI.LTD. 发明人 TOMIHARA SEIICHI
分类号 H01L23/12;H01L21/301;H01L21/56;H01L21/58;H01L23/31;H01L23/498;H05K3/00;H05K3/24;H05K3/28;(IPC1-7):H01L23/31 主分类号 H01L23/12
代理机构 代理人
主权项
地址