| 摘要 |
PROBLEM TO BE SOLVED: To provide a lighting system that can constitute an exposure system having excellent optical performance and throughput by improving the utilization efficiency of the light of a small throughput and the uniformity of lighting strength. SOLUTION: The lighting system which lights a surface to be lighted by using luminous flux is provided with a light source which emits the luminous flux, a reflection type integrator which forms a plurality of secondary light sources with the luminous flux emitted from the light source, and an optical means which changes the invariant of Helmholtz-Lagrange in orthogonally crossing two directions of the luminous flux made incident to the reflection type integrator. COPYRIGHT: (C)2005,JPO&NCIPI
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