| 摘要 |
PROBLEM TO BE SOLVED: To achieve stable manufacturing of pointed projections with high adhesion preventing property by using a photolithographic technique guaranteed in an exposure device and by controlling the etching amount of a sacrificial layer.SOLUTION: A concave section 12F with a pointed groove is made at a step coverage of approximately 50% by depositing a first upper sacrificial layer 12 after forming a first stepped part Don a first lower sacrificial layer 11 on top of a silicon substrate 10 and a first projection 15P which is pointed and composed of a part of a first insulating film 15 is provided by forming the first insulating film 15 on top of the concave section 12F after a movable electrode film 14 with a concave section through-hole is formed. In the same manner, a concave section 18F with the pointed groove is made by depositing a second upper sacrificial layer 18 on top of a second lower sacrificial layer 17 with a second stepped part Dand a pointed second projection 20P is provided by forming a second insulating film 20 after a fixed electrode 19 with the concave section through-hole is formed. |
