发明名称 SURFACE ACOUSTIC WAVE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a surface acoustic wave device in which an SiO<SB>2</SB>film is formed on an IDT so that not only frequency/temperature characteristics are enhanced but also a crack is hardly generated on the surface of the SiO<SB>2</SB>film, desired characteristics can be surely obtained and a coefficient of electromechanical coupling and a coefficient of reflection are great. SOLUTION: In a surface acoustic wave device 11, at least one IDT 13a, 13b constructed of a metal or an alloy of which the density is higher than that of Al is formed on an LiTaO<SB>3</SB>substrate 12 of 25-55°rotation Y-cut/X-propagation, and an SiO<SB>2</SB>film 15 for enhancing frequency/temperature characteristics is formed on the LiTaO<SB>3</SB>substrate 12 so as to cover the IDT 13a, 13b. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007104723(A) 申请公布日期 2007.04.19
申请号 JP20060351864 申请日期 2006.12.27
申请人 MURATA MFG CO LTD 发明人 KADOTA MICHIO;NAKAO TAKESHI;MIMURA MASAKAZU
分类号 H03H9/145;H01L41/09;H01L41/18;H03H3/08;H03H9/25 主分类号 H03H9/145
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