| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method of cleaning such apparatus. <P>SOLUTION: The immersion lithography apparatus reduces contamination of immersion liquid due to topcoat fragments of a substrate or an upper face of a substrate table, resists, residual particles, and the like; and accordingly, focusing defects are reduced; and as a countermeasure which prolongs life expectancy of components of the immersed lithography apparatus, an inlet is provided to supply cleaned liquid in a space between an object such as the substrate positioned on the substrate table and the substrate table. <P>COPYRIGHT: (C)2009,JPO&INPIT |
