发明名称 METHOD AND APPARATUS FOR CONTROLLING STAGE, METHOD AND APPARATUS FOR EXPOSURE, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To accurately keep control of a surface position and a posture of a substrate. <P>SOLUTION: A stage WTB driven in a first direction by a first drive signal and driven in a second direction intersecting with the first direction by a second drive signal is controlled. A correction step for correcting the first drive signal based on the second drive signal is provided. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009088018(A) 申请公布日期 2009.04.23
申请号 JP20070252347 申请日期 2007.09.27
申请人 NIKON CORP 发明人 ONO TAKASHI
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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