发明名称 |
METHOD AND APPARATUS FOR CONTROLLING STAGE, METHOD AND APPARATUS FOR EXPOSURE, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To accurately keep control of a surface position and a posture of a substrate. <P>SOLUTION: A stage WTB driven in a first direction by a first drive signal and driven in a second direction intersecting with the first direction by a second drive signal is controlled. A correction step for correcting the first drive signal based on the second drive signal is provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009088018(A) |
申请公布日期 |
2009.04.23 |
申请号 |
JP20070252347 |
申请日期 |
2007.09.27 |
申请人 |
NIKON CORP |
发明人 |
ONO TAKASHI |
分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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