发明名称 低質量種と高質量種の両方を含むイオン源を使用した誘導および試料処理
摘要 An improved method and apparatus for imaging and milling a substrate using a FIB system. Preferred embodiments of the present invention use a mixture of light and heavy ions, focused to the same focal point by the same beam optics, to simultaneously mill the sample surface (primarily with the heavy ions) while the light ions penetrate deeper into the sample to allow the generation of images of subsurface features. Among other uses, preferred embodiments of the present invention provide improved methods of navigation and sample processing that can be used for various circuit edit applications, such as backside circuit edit.
申请公布号 JP5922125(B2) 申请公布日期 2016.05.24
申请号 JP20130527296 申请日期 2011.08.31
申请人 エフ・イ−・アイ・カンパニー 发明人 チャド・ルー
分类号 H01J37/317;H01J27/02;H01J37/08;H01J37/28 主分类号 H01J37/317
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