| 摘要 |
Disclosed is a projection exposure apparatus which includes an illumination optical system for illuminating a pattern of a reticle with laser light from a continuous emission excimer laser, a projection optical system for projecting the illuminated pattern onto a substrate, and a wavelength stabilization mechanism for maintaining an emission wavelength of the excimer laser constant. The projection optical system is provided by a lens system being made of a substantially single glass material. With this arrangement, the pattern of the reticle can be projected on the substrate very accurately.
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