| 摘要 |
<p>A process for the removal of water and water derived impurities, e.g. OH-, substitutionally or interstitially incorporated in the structure of crystalline and amorphous materials, e.g. fused silica or aluminum oxide, wherein the material is exposed in powdered form to a gaseous mixture of halogen and carbon monoxide at a predetermined elevated temperature. The mixture of halogen and carbon monoxide reacts to cause the water and OH- ion concentration in the processed material to be reduced to an extremely low level. Materials purified by the process can be used to produce optical fibers and laser windows of excellent mechanical, thermal and optical properties.</p> |
