发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has favorable sensitivity to light and alkali developability, shows excellent voltage retaining characteristics in a cured product of the composition, and is used for forming projections for a vertical alignment type liquid crystal display element. <P>SOLUTION: The photosensitive resin composition (Q) is used for forming projections for a vertical alignment type liquid crystal display element and is alkali developable. The composition (Q) contains a hydrophilic resin (A) prepared by modifying an epoxy resin (A<SB>0</SB>) and containing a (meth)acryloyl group and a carboxyl group, a photoradical polymerization initiator (B), and a polyfunctional (meth)acrylate (C) having a (meth)acryloyl group concentration of not more than 7.5 mmol/g and shows a dielectric constant of from 2.5 to 3.5 after photo-curing the resin composition. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009086129(A) 申请公布日期 2009.04.23
申请号 JP20070253634 申请日期 2007.09.28
申请人 SANYO CHEM IND LTD 发明人 YAMAZAKI TAKURO;YAMAMOTO YUSUKE
分类号 G02F1/1337;C08F290/00;G03F7/027 主分类号 G02F1/1337
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