| 摘要 |
<P>PROBLEM TO BE SOLVED: To accurately form a mark for measuring the characteristics of a detecting apparatus, such as an alignment sensor etc., of an exposure device and to accurately measure the characteristics of the detection optical system of the detecting apparatus with high precision. <P>SOLUTION: A method of measuring the aberration of the detection optical system of the detecting apparatus for detecting the mark through the detection optical system includes the steps of irradiating an illumination light to a mark to be detected adjacently arranged with a first mark DM1 including a recess pattern 31a with a first width and a second mark DM2 including a recess pattern 32a having a second width narrower than the first width in the measuring direction, and measuring the predetermined optical characteristics of the detection optical system based on the measured result of the image of the mark to be detected. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
