| 摘要 |
PROBLEM TO BE SOLVED: To provide a an operation method of a processing system and the processing system capable of operating an exhaust unit even when a by-product containing silicon is deposited in the exhaust unit.SOLUTION: The operation method of the processing system includes the steps of: stopping a first exhaust unit from operating, which is connected to a processing unit; heating the stopped first exhaust unit; and resuming the operation of the heated first exhaust unit. The processing unit forms a film which contains silicon using a chlorine-containing gas on a substrate or removes the film containing silicon from the substrate.SELECTED DRAWING: Figure 1 |
