发明名称 |
Semiconductor processing component having low surface contaminant concentration |
摘要 |
A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelletized CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.
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申请公布号 |
US2002168867(A1) |
申请公布日期 |
2002.11.14 |
申请号 |
US20020078930 |
申请日期 |
2002.02.19 |
申请人 |
HAERLE ANDREW G.;MEDER GERALD S. |
发明人 |
HAERLE ANDREW G.;MEDER GERALD S. |
分类号 |
B24C1/00;B24C3/32;C04B41/53;C04B41/91;C23C16/44;H01L21/00;(IPC1-7):B08B3/00;C23G1/00;C03C23/00;C23G1/02;B08B7/00;B24B1/00;B08B3/14;B24C3/00;B24C5/04;H01L21/31 |
主分类号 |
B24C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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