| 发明名称 |
SUPPORT RING WITH MASKED EDGE |
| 摘要 |
A support ring for semiconductor processing is provided. The support ring includes a ring shaped body defined by an inner edge and an outer edge. The inner edge and outer edge are concentric about a central axis. The ring shaped body further includes a first side, a second side, and a raised annular shoulder extending from the first side of the ring shaped body at the inner edge. The support ring also includes a coating on the first side. The coating has an inner region of reduced thickness region abutting the raised annular shoulder. |
| 申请公布号 |
US2016247708(A1) |
申请公布日期 |
2016.08.25 |
| 申请号 |
US201615144446 |
申请日期 |
2016.05.02 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
BEHDJAT Mehran;TAM Norman L.;HUNTER Aaron Muir;RANISH Joseph M.;NAKANISHI Koji;NAKAGAWA Toshiyuki |
| 分类号 |
H01L21/687;C23C16/50;H01L21/67 |
主分类号 |
H01L21/687 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A support ring for semiconductor processing, comprising:
a ring shaped body comprising:
an inner edge and an outer edge; anda first side and a second side; and a coating on the first side, the coating having an outer region and an inner region, wherein the outer region is thicker than the inner region; and the inner region is located between the outer region and the inner edge. |
| 地址 |
Santa Clara CA US |
