发明名称 PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION, PHOTOSENSITIVE THERMOSETTING RESIN LAYER TRANSFER MATERIAL USING THE SAME AND IMAGE FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive thermosetting resin composition, superior in shelf stability, and also in solvent resistance and insulation property. SOLUTION: The photosensitive thermosetting resin composition contains an alkali-soluble resin, a protective type photosensitive material which controls the solubility of the alkali-soluble resin in an aqueous alkali solution and makes the solubility of the alkali-soluble resin enhanced in the aqueous alkali solution, when it is irradiated with light or a negative type photosensitive material which lowers the solubility of the alkali-soluble resin in the aqueous alkali solution, when it is irradiated with light and a crosslinking compound of formula (1) (where A is an organic residue, having at least two O atoms at the end; X is halogen, hydroxy or the like; and (n) is an integer of >=2).
申请公布号 JP2002156747(A) 申请公布日期 2002.05.31
申请号 JP20000353150 申请日期 2000.11.20
申请人 FUJI PHOTO FILM CO LTD 发明人 IWASAKI MASAYUKI;WAKATA YUICHI;YAMAMOTO MIZUKI
分类号 G03F7/004;C08F2/44;C08F2/50;C08F291/00;C08K5/00;C08K5/28;C08L101/08;C08L101/14;G02B5/20;G03F7/022;G03F7/027 主分类号 G03F7/004
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