发明名称 Vacuum processing apparatus and control method therefor
摘要 There is provided a vacuum processing apparatus and an exhausting apparatus of the vacuum processing apparatus according to which the auxiliary vacuum pump can be made smaller or eliminated, and hence energy-saving and space-saving can be achieved, and moreover the floor space occupied by the exhausting apparatus can be reduced, and hence the vacuum processing apparatus as a whole can be made smaller in size. A main vacuum pump has an intake port connected to a processing chamber in which an article to be processed is processed in a vacuum atmosphere, to exhaust the processing chamber to a vacuum state. An auxiliary vacuum pump is connected to a discharge port of the main vacuum pump to exhaust the main vacuum pump to a vacuum state. The main vacuum pump is a high back pressure type pump that exhausts the processing chamber to a vacuum state with a predetermined high back pressure value.
申请公布号 US2005167049(A1) 申请公布日期 2005.08.04
申请号 US20050092688 申请日期 2005.03.30
申请人 TOKYO ELECTRON LIMITED 发明人 KITAZAWA TAKASHI
分类号 C23C16/44;H01J37/18;H01L21/00;(IPC1-7):C23F1/00 主分类号 C23C16/44
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