| 摘要 |
<p>A photo mask with improved wafer pattern CD uniformity and a manufacturing method thereof are provided to achieve uniform CD distribution of wafer pattern by varying exposure energy according to a target CD. A reticle having patterns to be transferred on a wafer is formed on a transparent substrate(101). A CD distribution in an exposure field region of patterns transferred on the wafer by using the reticle is calculated(103). A light transmittance distribution for collecting a difference of the CD according to the CD distribution is calculated(107). A pellicle having the light transmittance distribution is formed, and then is coupled to the reticle(109).</p> |
