发明名称 Method for forming thin film photovoltaic interconnects using self-aligned process
摘要 Processing steps that are useful for forming interconnects in a photovoltaic module are described herein. According to one aspect, a method according to the invention includes processing steps that are similar to those performed in conventional integrated circuit fabrication. For example, the method can include etches to form a conductive step adjacent to the grooves that can be used to form interconnects between cells. According to another aspect the method for forming the conductive step can be self-aligned, such as by positioning a mirror above the module and exposing photoresist from underneath the substrate at an angle one or more times, and etching to expose the conductive step.
申请公布号 US7547570(B2) 申请公布日期 2009.06.16
申请号 US20060394721 申请日期 2006.03.31
申请人 APPLIED MATERIALS, INC. 发明人 BORDEN PETER;EAGLESHAM DAVID
分类号 H01L21/00 主分类号 H01L21/00
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