| 发明名称 |
STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS |
| 摘要 |
A chemically amplified resist composition that eliminates blob defects when used to produce semiconductor devices comprising: a base polymer with a protected group; a solvent; and a photoacid generator comprising an iodonium salt containing a water-soluble group of a solphonium group containing a water-soluble group. |
| 申请公布号 |
WO0201296(A2) |
申请公布日期 |
2002.01.03 |
| 申请号 |
WO2001US20657 |
申请日期 |
2001.06.28 |
| 申请人 |
INFINEON TECHNOLOGIES NORTH AMERICA CORP. |
发明人 |
LU, AHIJIAN;GUTMAN, ALOIS |
| 分类号 |
G03F7/004;G03F7/039 |
主分类号 |
G03F7/004 |
| 代理机构 |
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