发明名称 HOLDING TOOL AND WORKPIECE JOINING AND DETACHING METHOD TO/FROM THE SAME
摘要 PROBLEM TO BE SOLVED: To join a planar workpiece like a semiconductor wafer (8) to one side of a holding tool (2) without restraining air bubbles and to detach the workpiece part from the holding tool (2) without generating excessive stress in the workpiece, by improving the holding tool (2) itself and a workpiece joining and detaching method to/from the holding tool (2). SOLUTION: This holding tool (2) is formed of synthetic resin which becomes a rubber state when heated to above a glass transfer temperature and becomes a glass state when cooled to below the glass transfer temperature. When the workpiece is joined and detached to/from the holding tool (2), the holding tool (2) is heated to above the glass transfer temperature to make the tool (2) into the rubber state.
申请公布号 JP2003053639(A) 申请公布日期 2003.02.26
申请号 JP20010247919 申请日期 2001.08.17
申请人 DISCO ABRASIVE SYST LTD 发明人 KITAMURA MASAHIKO
分类号 B23Q3/08;B24B37/04;B24B37/30;H01L21/301;H01L21/304;H01L21/68;H01L21/683 主分类号 B23Q3/08
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