| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electrostatic attractor which does not cause non-uniform residual attractive force and a vacuum processor using the electrostatic attractor. SOLUTION: A surface of an attractive plate 12 of an electrostatic attractor 2 is formed to be ragged. The projection parts 91 , 92 are disposed on positive and negative electrodes 15, 16 inside the attractive plate 12. When a substrate 20 is mounted on a mounting face 18, a back face of the substrate 20 comes into face contact with a surface of the projection parts 91 , 92 , and static electricity is attracted in a state of coming into non-contact with a bottom face of a recess part 8. Since a distance between the substrate 20 and an electrode is fixed in a part of coming into contact with the surface of the projection parts 91 , 92 , an electrostatic attractive force is uniform on the projection parts 91 , 92 , and a residual attractive force is made uniform. Accordingly, when a plurality of substrates are processed, electrostatic attractive forces between the substrates are equalized.</p> |
