| 摘要 |
The present invention relates to a substrate processing device comprising: a housing which provides a space for processing a substrate therein; a spin head which supports and rotates the substrate inside the housing; and a spray unit which includes a first nozzle member spraying a first processing solution to the substrate positioned on the spin head. The first nozzle member comprises: a body which includes a spray flow path in which the first processing solution flows, and a first outlet which communicates with the spray flow path and sprays the first processing solution to the substrate; a vibrator which is installed inside the body, and vibrates the first processing solution flowing in the spray flow path; a processing solution supplying line which includes a first valve supplying the first processing solution to the body; and a pressure controlling member which connects a front end and a back end of the first valve, and monitors pressure of the processing solution supplying line by measuring pressure difference between the front end and the back end. |
