发明名称 Opening filling apparatus for manufacturing a semiconductor device
摘要 There are disclosed an opening filling apparatus and a method for manufacturing a semiconductor device by using the same. An opening of a semiconductor device is filled by using the filling apparatus comprising: a chamber having a rotation shaft, a motor, a plurality of plates arranged in a circular form centering at the rotation shaft, and a heater; and injectors for injecting gas. When the opening of a semiconductor device such as a trench or a contact hole is filled, filling material may move down by using the centrifugal force generated by rotating the substrate, to thereby fill the opening completely without a void.
申请公布号 US5985034(A) 申请公布日期 1999.11.16
申请号 US19970925264 申请日期 1997.09.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, TAI-SU
分类号 H01L21/31;H01L21/00;H01L21/02;H01L21/28;H01L21/762;H01L21/768;(IPC1-7):C23C16/00 主分类号 H01L21/31
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