| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist material to which an acid generating agent is added, is particularly excellent in resolution and shows small dimensional difference between an isolated pattern and a dense pattern and small line edge roughness. SOLUTION: The resist material comprising a base resin which is a polymer structure containing no aromatic substituent, an acid generating agent and a solvent, is characterized in that the acid generating agent generates a perfluoroalkylether sulfonic acid. |
