发明名称 |
Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system |
摘要 |
A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.
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申请公布号 |
US2002092547(A1) |
申请公布日期 |
2002.07.18 |
申请号 |
US20010956459 |
申请日期 |
2001.09.20 |
申请人 |
YOU DONG-JUN;OH JONG-WOON |
发明人 |
YOU DONG-JUN;OH JONG-WOON |
分类号 |
H01L21/304;B08B3/04;B08B7/00;H01L21/00;(IPC1-7):B08B3/04 |
主分类号 |
H01L21/304 |
代理机构 |
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地址 |
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