发明名称 |
NITROGEN GAS SUPPLY SYSTEM |
摘要 |
<p>A nitrogen gas supply system which can efficiently supply nitrogen gas to a wafer processing unit 31 for applying a predetermined processing to wafers and to a nitrogen gas tunnel type wafer conveyor 32 for transporting the wafers to the wafer processing unit 31 through a gate valve 37 in sufficient and necessary amounts and with sufficient and necessary purity levels, respectively. This nitrogen gas supply system has a passage 38 for supplying high-purity nitrogen gas obtained in a cryogenic air separation plant 33 serving as a nitrogen gas generator to the wafer processing unit 31, a circulating passage 40 securing communication between outlet 32a and inlet 32b of the conveyor 32 via a purifier 39, and a replenishing passage 44 for replenishing nitrogen gas from a liquid nitrogen tank 36 to the circulating passage 40. <IMAGE></p> |
申请公布号 |
EP0750340(B1) |
申请公布日期 |
2006.12.20 |
申请号 |
EP19960900183 |
申请日期 |
1996.01.08 |
申请人 |
TAIYO NIPPON SANSO CORPORATION;OHMI, TADAHIRO |
发明人 |
OHMI, TADAHIRO;ISHIHARA, YOSHIO |
分类号 |
C23C14/32;H01L21/00;B01D53/04;B65G49/07;C23C14/34;C23C14/46;C23C16/44;C23C16/455;F24F7/06;F25J3/04;F25J3/08;H01L21/02;H01L21/20;H01L21/302;H01L21/3065;H01L21/677;H01L21/68 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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