发明名称 METHOD FOR PRODUCING SINTERED BODY, SINTERED BODY, SPUTTERING TARGET COMPOSED OF THE SINTERED BODY, AND SPUTTERING TARGET-BACKING PLATE ASSEMBLY
摘要 Disclosed is a method for producing a sintered body, which is characterized in that raw material powders respectively composed of a chalcogenide element and a Vb group element or raw material powders of an alloy of two or more elements including a chalcogenide element and a Vb group element are mixed, and the thus-mixed powder is hot pressed under the conditions satisfying the following formula: P (pressure) = {Pf/(Tf-T0)} OE(T-T0) + P0 (Pf: final pressure, Tf: final temperature, P0: atmospheric pressure, T: heating temperature, T0: room temperature (temperatures are expressed in degrees Celsius)). This method enables to produce a sintered body which has high density, high strength and large diameter, while containing a chalcogenide element (A) and a Vb group element (B) or containing the elements (A) and (B) and additionally a IVb group element (C) and/or an additive element (D). This sintered body does not suffer from cracks when assembled into and used in a sputtering target-backing plate assembly. Also disclosed are such a sintered body, a sputtering target composed of such a sintered body, and a sputtering target-backing plate assembly.
申请公布号 WO2009034775(A1) 申请公布日期 2009.03.19
申请号 WO2008JP62908 申请日期 2008.07.17
申请人 NIPPON MINING & METALS CO., LTD.;TAKAHASHI, HIDEYUKI 发明人 TAKAHASHI, HIDEYUKI
分类号 C22C1/04;B22F3/14;C22C12/00;C22C28/00;C23C14/34 主分类号 C22C1/04
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