发明名称 Silicon based charge neutralization systems
摘要 An embodiment of the invention provides a method for low emission charge neutralization, comprising: generating a high frequency alternating current (AC) voltage; transmitting the high frequency AC voltage to at least one non-metallic emitter; wherein the at least one non-metallic emitter comprises at least 70% silicon by weight and less than 99.99% silicon by weight; wherein the at least one emitter comprises at least one treated surface section with a destroyed oxidation layer; and generating ions from the at least one non-metallic emitter in response to the high frequency AC voltage. Another embodiment of the invention provides an apparatus for low emission charge neutralization wherein the apparatus can perform the above-described operations.
申请公布号 US9380689(B2) 申请公布日期 2016.06.28
申请号 US201514665994 申请日期 2015.03.23
申请人 ILLINOIS TOOL WORKS INC. 发明人 Gefter Peter;Klochkov Aleksey
分类号 H01T23/00;H05F3/06;B08B7/00;B32B7/12;B32B15/08;B32B15/082;B32B15/085;B32B15/18;B32B17/10;B32B27/30;B32B27/32;H01L31/048 主分类号 H01T23/00
代理机构 Uriarte Law 代理人 Uriarte Law
主权项 1. A method for low emission charge neutralization, comprising: generating a high frequency alternating current (AC) voltage; transmitting the high frequency AC voltage to at least one non-metallic emitter; wherein the at least one non-metallic emitter comprises at least 70% silicon by weight and less than 99.99% silicon by weight; wherein the at least one emitter comprises at least one treated surface section with a destroyed oxidation layer; generating ions from the at least one non-metallic emitter in response to the high frequency AC voltage; wherein the at least one non-metallic emitter comprises a first ratio S/D in a range from 0.03 to 0.06; wherein S is a thickness of a sleeve that receives the at least one non-metallic emitter; and wherein D is a diameter of a shaft of the at least one non-metallic emitter.
地址 Glenview IL US