发明名称 |
Silicon based charge neutralization systems |
摘要 |
An embodiment of the invention provides a method for low emission charge neutralization, comprising: generating a high frequency alternating current (AC) voltage; transmitting the high frequency AC voltage to at least one non-metallic emitter; wherein the at least one non-metallic emitter comprises at least 70% silicon by weight and less than 99.99% silicon by weight; wherein the at least one emitter comprises at least one treated surface section with a destroyed oxidation layer; and generating ions from the at least one non-metallic emitter in response to the high frequency AC voltage. Another embodiment of the invention provides an apparatus for low emission charge neutralization wherein the apparatus can perform the above-described operations. |
申请公布号 |
US9380689(B2) |
申请公布日期 |
2016.06.28 |
申请号 |
US201514665994 |
申请日期 |
2015.03.23 |
申请人 |
ILLINOIS TOOL WORKS INC. |
发明人 |
Gefter Peter;Klochkov Aleksey |
分类号 |
H01T23/00;H05F3/06;B08B7/00;B32B7/12;B32B15/08;B32B15/082;B32B15/085;B32B15/18;B32B17/10;B32B27/30;B32B27/32;H01L31/048 |
主分类号 |
H01T23/00 |
代理机构 |
Uriarte Law |
代理人 |
Uriarte Law |
主权项 |
1. A method for low emission charge neutralization, comprising:
generating a high frequency alternating current (AC) voltage; transmitting the high frequency AC voltage to at least one non-metallic emitter; wherein the at least one non-metallic emitter comprises at least 70% silicon by weight and less than 99.99% silicon by weight; wherein the at least one emitter comprises at least one treated surface section with a destroyed oxidation layer; generating ions from the at least one non-metallic emitter in response to the high frequency AC voltage; wherein the at least one non-metallic emitter comprises a first ratio S/D in a range from 0.03 to 0.06; wherein S is a thickness of a sleeve that receives the at least one non-metallic emitter; and wherein D is a diameter of a shaft of the at least one non-metallic emitter. |
地址 |
Glenview IL US |