发明名称 BAKING TRANSFER FILM AND FORMING METHOD OF BASE WITH FUNCTIONAL PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a baking transfer film, which is excellent in transferability of functional pattern and enables the thermal cracking gas of an organic matter to be smoothly released, as well as the functional pattern free of defects such as poor shape, function or the like to be formed on the base. SOLUTION: This baking transfer film includes a releasing film and a laminate formed in contact with the one side of the releasing film and, in addition, the laminate includes a self-adhesive layer for pasting the baking transfer film onto the surface of the base and the functional pattern formed between the releasing film and the self-adhesive layer. The functional pattern includes inorganic powder and a first organic matter removable by baking. The self-adhesive layer includes a second organic matter, which is removable by baking and is different from the first organic matter. Further, an inequality: Tdb<Tda<Tw is satisfied, wherein let Tdb be the thermal cracking temperature of the first organic matter at the baking conditions of the laminate transferred to the surface of the base and baked, Tda be the thermal cracking temperature of the second organic matter and Tw be the fusing temperature of the inorganic powder. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008307729(A) 申请公布日期 2008.12.25
申请号 JP20070156038 申请日期 2007.06.13
申请人 TOPPAN TDK LABEL CO LTD;NIPPON SHEET GLASS CO LTD 发明人 IIKUMA AKIHIRO;SHINOZAKI HIDEAKI;KIKUCHI MASAHIRO;OTSUKA TATSUYA;KUBO TAIICHI;ONO KAZUHISA
分类号 B44C1/165 主分类号 B44C1/165
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