发明名称 |
PHTHALIMIDE COMPOUNDS FOR FORMING AMORPHOUS LAYERS BY VACUUM DEPOSITION |
摘要 |
There are disclosed phthalimide compounds of structure (I), wherein R and R<1> are independently selected from the group consisting of nitro, foramido groups, carbamoyl groups and heterocyclic groups derived from amino or carboxyl groups. |
申请公布号 |
WO9005722(A1) |
申请公布日期 |
1990.05.31 |
申请号 |
WO1989US04974 |
申请日期 |
1989.11.13 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
MACHIELE, DELWYN, EARL;BRAZAS, JOHN, CHARLES, JR. |
分类号 |
C07D209/48 |
主分类号 |
C07D209/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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