| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a synthetic quartz glass material, which composes an optical system that transmits an ArF excimer laser beam having an energy density per pulse in the range of 0.001-0.5 mJ/cm<SP>2</SP>and especially composes an optical system comprising a lens, a prism, a window, etc., suitably usable for the photolithography device for a semiconductor wafer, and of which the double refraction quantity slightly changes when irradiated with a laser beam. <P>SOLUTION: The synthetic quartz glass material is used for an optical system in an ArF photolithography device which transmits the ArF excimer laser beam having an energy density per pulse in the range of 0.001-0.5 mJ/cm<SP>2</SP>. In the material, the homogeneityΔn of its refractive index is≤1×10<SP>-6</SP>, the quantity of its double refraction is≤1 nm/cm, its internal transmittance of an ultraviolet beam having a wavelength of 193.4 nm is≥99.7%. Besides, its OH group concentration is made≥5 ppm and≤300 ppm, and its hydrogen molecule concentration is made≥1×10<SP>16</SP>molecules/cm<SP>3</SP>and <2×10<SP>17</SP>molecules/cm<SP>3</SP>. <P>COPYRIGHT: (C)2003,JPO</p> |
